SavvyBlog Archive - 2012 posts

2012 posts

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June 29, 2012

I fixed an error in the MIL/ANSI accumulator, where the Max dig count criteria was not causing rejection.  
Please download the latest version by clicking on the spreadsheet to the left.  As usual, it is offered for free
and without warranty, etc.

May 14, 2012

Big news!  Enable KK of Tokyo has signed on to distribute the SIF-4 in Japan!  We're thrilled to bring Hideki
Ogawa's team into the family, and look forward to many sales and customer successes in Japan.  I will be
going over to visit with Enable KK in July, so if you want to schedule a meeting while I am there, please contact
Ogawasan via Enable KK's website.

April 23, 2012

Well at long last, I finally got around to creating the ISO version of the SavvyAccumulatorTM.  Click on it on the
sidebar to download it.  As with the MIL/ANSI version, it is my best attempt at an an Excel spreadsheet for
accumulation, and is offered without warranty.  Download at your own risk and so on.  If you try it out, please
get me feedback on whether it is useful, correct, or whatever.  The next time I take a train somewhere, I'll try to
do the OP1.002-Dimensional rules, so we'll have the full set.

January 31, 2012

We had another great Photonics West, exhibiting with our friends from Aperture Optical Sciences, Inc.,
Okamoto Optics
, Opto SiC, and Plymouth Grating.  We were joined by Mike Hotkowski, who helped out by
holding down the booth while I was doing the
OEOSC meetings and teaching my classes.  The meetings and
classes went great, and I'm looking forward to teaching again next year.
December 11, 2012

Dana has written a technical paper describing how to use a SavvyInspectorTM to do surface quality
inspections, called "Objective scratch and dig measurement."  In in she describes the new SIF4 software and
the exact methodology for making repeatable, objective measurements.  
Check it out!

This requires a major overhaul to the sections on surface form (Part 5) and centering (Part 6) which is being
led by the German delegation.  A key decision we need to make is how to define "freeform" optics.  All good
stuff, and I think we can expect some significant improvements to ISO 10110 in 2013 and 2014.  

In February we will continue our discussions on adoption of the ISO notation through the National Adoption of
an International Standard (NAIS) process.  We want to release the US version by the end of 2013, at least with
the fundamental sections.  Come by the
OEOSC Meetings at Photonics West to hear first-hand what is going

October 12, 2012

It's been a busy month.  We just installed the third Series 5 system in Chicago.  The first one is a lease system
we retro-fitted, that is now in CA.  The second series 5 system, SN7125, which was installed in Rochester last
month, was also the first system built here in CT by Dana.  The new software is a big improvement, and offers
ISO mode for general imperfections, in addition to the MIL and ANSI inspection capability. If you are a series 3
or 4 SavvyInspector
TM owner and want to get the latest software, contact me to get started.

October 1, 2012

Finally finished the new proposed draft of ISO 10110-7 and ISO 14997 which includes the ANSI Scratch and
Dig method as well as the existing DIN 3140 based method for surface imperfections.  We'll be presenting this
at the TC172/SC1 meeting at St. Gallen later this month.  Hopefully the committee will agree that the approach
is sound, and we can proceed with a working draft.

July 7, 2012

I'm very excited that version 5 of the SavvyInspectorTM SIF-4 software is now in beta testing! This update
cleans up a lot of issues associated with the image window, scratch length, and magnification, and also gets
far better results on very fat scratches or digs which are composed of multiple unresolved scattering sources.
The update also has a new mode to allow general imperfection grades to be reported according to ISO
10110-7.  It's still a scatterometer, not a digital microscope, so it gets the apparent size that you would get from
a DIN-style visual inspection, but that correlates nicely with expert inspector results anyway.

Check out this new video Dana made, with the latest software including ISO mode!
November 21, 2012

ISO TC172 SC1 meetings in St. Gallen,
Switzerland went very well. The US presented
their proposed changes to ISO 10110-1, -10,
and -7, as well as ISO 14997.  I think these
changes are very important to broader
adoption of the drawing notation standard.  
We also had some great discussions on the
changes needed to allow us to specify
aspheric optics more completely.